About Dr. Jeff Jessing
Jeff Jessing is an assistant professor in the Department of Physics & Engineering at Fort Lewis College. He joined the faculty in 2013. Jessing is currently investigating the unique electrical and optical properties of porous silicon, with an eye to the development of several high impact technologies in the fields of sensors, computing, and instrumentation. Jessing has considerable experience in research and manufacturing environments, including the development, fabrication, and characterization of novel electronic & optical materials/devices, microelectromechanical systems (MEMS) and integrated microelectromechanical systems (IMEMS), novel methods of characterization and design of microsensors, application of thin film processing techniques to the development of bio-MEMS and bio-electronic components, characterization and modeling of process dependent radiation effects in CMOS, and process/device modeling.
Prior to joining the faculty at Fort Lewis College, Jessing was the vice president of research and co-owner of Sitanium, a company involved in the development and technology transfer of novel microfabricated medical devices, an assistant professor at Boise State University, and a technical staff member at Sandia National Laboratories in Albuquerque. He is a member of the Institute for Electrical and Electronics Engineers and the Phi Kappa Phi Honor Society.
Books and Authored Chapters
"Chapter 7: CMOS Fabrication," in CMOS: Circuit Design, Layout, and Simulation, 2nd and 3rd editions, Wiley Press, 2005/2010
"Chapter 12: CMOS Fabrication," in The VLSI Handbook,” CRC Press, 2007
“CMOS, Circuit Design, Layout, and Simulation”, R. Jacob Baker, Chapter 7: CMOS Fabrication, 2nd Ed., WileyPress, 2005, ISBN 978-0471700555.
Selected Publications and Presentations
V. Fusco and J. Jessing, “To See or Not to See: Micromachined Silicon Blades for LASIK Surgery, 2004 NIH BRIN Conference (August 2004).
P. Reddy and J. Jessing, “Pattern Alignment Effects in Through-Wafer Bulk Micromachining of (100) Silicon,” Proceedings of the 2004 IEEE Workshop on Microelectronics and Electron Device, 89 (April 2004).
G. Gatlin, C. Eskridge, J. Brinkerhoff, J. Fife, and J. Jessing, “Process Development of Electron Beam Lithography in an Academic Environment,” Proceedings of the 2004 IEEE Workshop on Microelectronics and Electron Devices, 117 (April 2004).
J. Hartman, J. Baker, M. Gribb, J. Jessing, A. Moll, W. Prouty, D. Russell, and H. Hill, “A miniaturized Ion Mobility Spectrometer (IMS) sensor for wireless operation,” presented at the Frontiers in Assessment Methods for the Environment Symposium, Minneapolis, Minnesota (August 2003).
T. Vamsi Krishna, J. R. Jessing, D. D. Russell, J. Scaggs, L. R. Warner and J. A. Hartman, “Modeling and Design of Polythiophene Gate Electrode ChemFETs for Environmental Pollutant Sensing,” Proceedings of the 15th Biennial IEEE UGIM, 271 (July 2003).
M. Okandan, K. O. Wessendorf, T. R. Christenson, M. Rightley, R. J. Shul, J. Jessing, M. Baker, P. Galambos, "Micromachined Conformal Electrode Array for Retinal Prosthesis Application," Proceedings of SPIE, vol. 4982 (January 2003).
J. R. Jessing and P. Tangyunyong, “Poly Stringers: a Yield Limiting Defect in a 0.5um Radiation-Hardened CMOS Technology,” presented at the 27th International Symposium for Testing and Failure Analysis, Phoenix, AZ (November 2002).
M. Okandan, J. Jessing, T. Christenson, K. Wessendorf, M. Baker, P. Galambos, and R. Myers, “Micromachined Conformal Electrode Array for Retinal Prosthesis Application,” submitted to 2nd Annual International IEEE-EMBS Special Topic Conference on Microtechnologies in Medicine and Biology, Madison, WI (May 2002).
D. M. Fleetwood, A. N. Campbell, P. Tangyunyong, C. E. Hembree, J. R. Jessing, J. M. Soden, N. Antoniou, “Mechanisms of Focused Ion Beam Damage to MOS Integrated Circuits,” presented at IEEE NSREC (July 2000).
D. M. Fleetwood, A. N. Campbell, C. E. Hembree, P. Tangyunyong, J. R. Jessing, and J. M. Soden, “Focused Ion Beam Damage to MOS Integrated Circuits,” Sandia Report, SAND2000-1163C (March 2000).
D. R. Myers, J. R. Jessing, O. B. Spahn, and M. R. Shaneyfelt, “Investigations of the Impact of the Process Integration of the Deposited Magnetic Films for Magnetic Memory Technologies on Radiation Hardened CMOS Devices and Circuits,” Sandia Report SAND2000-0218 (January 2000).
AN. Campbell, P. Tangyunyong, J. R. Jessing, C. E. Hembree, D. M. Fleetwood, S. E. Swanson, J. M. Soden, N. Antoniou, W. E. Vanderlinde, M. T. Abramo, “Focused Ion Beam Induced Effects on MOS Transistor Parameters,” 25th International Symposium for Testing and Failure Analysis, Santa Clara, CA (November 1999).
H. R. Kim, J. R. Jessing, and D. L. Parker, “Emission Stability of Anodized Silicon Field Emitter Arrays,” Journal of Vacuum Science Technology B, 17 (2), 601 (March 1999).
J. R. Jessing, H. R. Kim, D. L. Parker, and M. H. Weichold, “Fabrication and Characterization of Gated Porous Silicon Cathode Field Emission Arrays,” Journal of Vacuum Science Technology B, 16 (2), 777 (March/April 1998).
H. R. Kim, J. R. Jessing, and D. L. Parker, “Porous Silicon Field Emission Arrays with Built-in Spacer,” Journal of Vacuum Science Technology B, 16 (2) (March/April 1998).
J. R. Jessing, “Gated Porous Silicon Cathode Field Emission Arrays,” presented at the Tenth International IEEE Vacuum Microelectronics Conference, Kyongju, Korea (August 1997).
J. R. Jessing, D. L. Parker, and M. H. Weichold, “Porous Silicon Field Emission Cathode Development,” Journal of Vacuum Science Technology B, 14 (3), 1899 (May/June 1996).